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Sample Fabrication

Substrate

n-Si(100), ρ = ? Ω-cm

Implantation conditions

Au, 50 keV, 1e15 /cm2 dose

Pulsed laser melting

Spot	Spot size	Laser used	Shooting conditions	Result
A	2.5x2.5 mm2, masked	Benet YAG, 355 nm	1 shot @ 0.65 J/cm2
B	2.5x2.5 mm2, masked	Benet YAG, 355 nm	1 shot @ 0.65 J/cm2

Measurements and processing

Sample 5A

8/21/2012 SEM, non-uniform and very messy surface but no sign of breakdown.
AuSi Jeff YAG 1e15 Spot a 67 kx.tif
AuSi Jeff YAG 1e15 Spot a 182kx.tif
AuSi Jeff YAG 1e15 Spot a 460kx.tif

Sample 5B

8/21/2012 SEM, non-uniform surface but no sign of breakdown.

AuSi Jeff YAG 1e15 Spot b 475 kx.tif
AuSi Jeff YAG 1e15 Spot b 103 kx.tif
AuSi Jeff YAG 1e15 Spot b 335 x 2.tif
AuSi Jeff YAG 1e15 Spot b 335 x.tif