Sample Fabrication
Substrate
n-Si(100), ρ = ? Ω-cm
Implantation conditions
Au, 50 keV, 1e15 /cm2 dose
Pulsed laser melting
Spot |
Spot size |
Laser used |
Shooting conditions |
Result |
|---|---|---|---|---|
A |
2.5x2.5 mm2, masked |
Benet YAG, 355 nm |
1 shot @ 0.65 J/cm2 |
|
B |
2.5x2.5 mm2, masked |
Benet YAG, 355 nm |
1 shot @ 0.65 J/cm2 |
|
Measurements and processing
Sample 5A
- 8/21/2012 SEM, non-uniform surface but no sign of breakdown.
Sample 5B
- 8/21/2012 SEM, non-uniform surface but no sign of breakdown.