You are viewing an old version of this page. View the current version.

Compare with Current View Page History

Version 1 Next »

Return to Sample Master List

Sample Fabrication

Substrate # Need update

n-Si(100), ρ = 1-10 Ω-cm

Implantation conditions

Au, 50 keV, 1e15 /cm2 dose

Pulsed laser melting # Need update

Spot

Spot size

Laser used

Shooting conditions

Result

A

2.5x2.5 mm2, masked

Harvard YAG, 355 nm

1 shot @ 0.7 J/cm2

good

B

2.5x2.5 mm2, masked

Harvard YAG, 355 nm

1 shot @ 0.7 J/cm2

dirty spot, bad TRR

C

2.5x2.5 mm2, masked

Harvard YAG, 355 nm

1 shot @ 0.7 J/cm2

good

D

2.5x2.5 mm2, masked

Harvard YAG, 355 nm

1 shot @ 0.7 J/cm2

good

E

2.5x2.5 mm2, masked

Harvard YAG, 355 nm

1 shot @ 0.7 J/cm2

good

Measurements and Processing

Sample 9D
  • No labels